Removal of inorganic coatings from glass substrates

ABSTRACT

Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etching rate and the glass substrate is etched as a glass etching rate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of priority under 35 U.S.C. §119 ofU.S. Provisional Application Ser. No. 62/258,640 filed on Nov. 23, 2015,the content of which is relied upon and incorporated herein by referencein its entirety.

BACKGROUND

The disclosure relates processes for removing inorganic coatings fromglass substrates, particularly glass substrates that are used as coverglass for handheld devices with display screens.

Handheld electronic devices such as mobile phones and tablets include acover substrate, which is typically a glass and referred to as a coverglass. A cover glass may contain various layers of coatings such as ananti-reflective (AR) coating, a coating to reduce fingerprints, whichmay be an oleophobic coating, and one or more ink coatings forfunctionality and aesthetic purposes. A cover glass manufacturingprocess typically involves application of one or more of theseaforementioned coatings, which may be organic or inorganic coatings. Formany cover glasses, there is a multilayer inorganic antireflectivecoating over which an organic ink coating is applied, which provides anenhanced color appearance. Part of the manufacturing process of coverglass includes selectively removing one or more of the coating layersfrom the glass substrate from the viewing area of the cover glassbecause the coatings reduce the ability to view the display. Removal ofone or more of the coating layers typically involves contacting thecoating layers with a stripping or etching solution. The coating removalprocess should be conducted without damaging the glass substrate.

SUMMARY

Embodiments of the disclosure pertain methods of etching an inorganiclayer on a glass substrate comprising contacting the glass substrateincluding an inorganic layer with an etching solution comprising a polarorganic solvent and an etchant, wherein the inorganic layer is removedat an inorganic layer etching rate and the glass substrate is etched asa glass etching rate.

Another embodiment pertains to a method of controlling the etch rate ofa glass substrate including an inorganic layer, the method comprisingcontacting the glass substrate including the inorganic layer with anetching solution comprising a polar organic solvent and an etchantselected from HCl, NH₄HF₂, HF, NaOH, KOH, tetramethyl ammoniumhydroxide, and combinations thereof, wherein the inorganic layerincludes titanium and the inorganic layer is removed at an inorganiclayer etching rate and the glass substrate is etched as a glass etchingrate and the glass substrate comprises an ion exchanged glasscomposition with a compressive stress layer having a compressive depthof layer of at least 10 μm and extending from a surface of the glass tothe depth of layer, and wherein the compressive layer is under acompressive stress of at least about 300 MPa.

These and other aspects, advantages, and salient features will becomeapparent from the following detailed description, the accompanyingdrawings, and the appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic cross-sectional view of a glass substrate after anetching process;

FIG. 2 is graph showing etch rate versus weight percent of propyleneglycol; and

FIG. 3 is a graph showing transmission versus wavelength through variousglass substrates.

DETAILED DESCRIPTION

As used herein, the indefinite articles “a,” “an,” and the correspondingdefinite article “the” mean “at least one” or “one or more,” unlessotherwise specified. It also is understood that the various featuresdisclosed in the specification and the drawings can be used in any andall combinations.

As used herein, the terms “glass substrate” and “glass substrates” areused in their broadest sense to include any object made wholly or partlyof glass. Unless otherwise specified, all glass compositions areexpressed in terms of mole percent (mol %) and all ion exchange bathcompositions are expressed in terms of weight percent (wt %).

It is noted that the terms “substantially” and “about” may be utilizedherein to represent the inherent degree of uncertainty that may beattributed to any quantitative comparison, value, measurement, or otherrepresentation. These terms are also utilized herein to represent thedegree by which a quantitative representation may vary from a statedreference without resulting in a change in the basic function of thesubject matter at issue.

According to one or more embodiments, “handheld device” refers to aportable electronic device that has a display screen. Non-limitingexamples of such handheld devices include a mobile telephone, a readingdevice, a music device, a viewing device and a navigation device.Non-limiting examples of such devices are iPhone®, Nook®, iPod®, iPad®,Droid®, Kindle® and GPS navigation systems.

As will be described further below, the present disclosure pertains toremoval of one or more layers or coatings from a glass substrate that isused as a cover glass for a handheld device that has a display screen.As part of the manufacturing process to provide better transmissionthrough the viewable area of a display screen etching of one or moreorganic or inorganic layers is performed on such glass substrates.Referring to FIG. 1, a glass substrate 100 used as a cover glass for ahandheld device typically has a plurality of antireflective layers, forexample, a first antireflective layer 110, a second antireflective layer112, a third antireflective layer 114, and a fourth antireflective layer116. The number and arrangement of antireflective layers is exemplaryonly and not intended to be limiting. The antireflective layers maycomprise alternating layers of inorganic materials, for example, SiO₂and a titanium containing layer (e.g., TiO₂/TiC), or other materialssuch as Al₂O₃. Various organic layers may be deposited on theantireflective layers, for example, a first organic layer 120, a secondorganic layer 122 and a third organic layer 124. These organic layersmay include ink or coloring for surface and aesthetic effects. Duringthe manufacturing process, glass substrate viewing area 130 may beetched or stripped to remove or reduce one or more of the layers 110,112, 114, 116, 120, 122, and/or 124. Etching or stripping is achieved byselectively contacting an area of the substrate 130 to be etched with anetching or stripping solution. In one or more embodiments, theantireflective layers 110, 112, 114, 116 collectively have a totalthickness in the range of 5 nm and 200 nm, for example, 10 nm, 20 nm, 30nm, 40, nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm,130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, or 190 nm.

Etching or stripping solutions comprising water and an etchant aretypically used during etching or stripping. Suitable exemplary etchantsinclude HCl, NH₄HF₂, HF, NaOH, KOH, tetramethyl ammonium hydroxide, andcombinations thereof, which may be diluted in water at variousconcentration (e.g. 10%). The substrates are contacted with the etchingsolution, for example by dipping, spraying or wiping at an appropriatetemperature and for a suitable time to remove the desired amount ofcoating or layer. In an example of one suitable process, a substratehaving a coating or layer thereon to be removed are loaded in a cassetteholder, and the holder containing the substrates is soaked in a bathcontaining etchant at the desired temperature and for a desired durationof time to achieve the desired amount of coating to be removed. Physicalagitation may be used in the bath if desired. Upon removal from theetching solution, the substrates are rinsed in water to remove extraetchant residue. The substrates are then are visually inspected toevaluate whether the coating is removed or not, and if the glasssubstrate has been damaged or not.

Glass substrates according to one or more embodiments can be selectedfrom soda lime glass, alkali aluminosilicate glass, alkali containingborosilicate glass and alkali aluminoborosilicate glass. In one or moreembodiments, the substrate is a glass, and the glass can bestrengthened, for example, heat strengthened, tempered glass, orchemically strengthened glass. In one or more embodiments, strengthenedglass substrates have a compressive stress (CS) layer with a CSextending within the chemically strengthened glass from a surface of thechemically strengthened glass to a compressive stress depth of layer(DOL) of at least 10 μm to several tens of microns deep. In one or moreembodiments, the glass substrate is a chemically strengthened glasssubstrate such as Corning Gorilla® glass.

In strengthened glass substrates, there is a stress profile in whichthere is a compressive stress (CS) on the surface and tension (centraltension, or CT) in the center of the glass. According to one or moreembodiments, the screen cover can be thermally strengthened, chemicallystrengthened, or a combination of thermally strengthened and chemicallystrengthened.

Surprisingly, it was determined that contacting glass substrates withetching or stripping solutions to remove one or more organic orinorganic coatings or layers caused the underlying glass substrate to beetched such that the compressive stress at the surface of the glasssubstrate was reduced. United States Patent Application PublicationNumber US20140162036 explains that acid etching addresses the fact thatglass strength is extremely sensitive to the size and the tip shape ofsurface flaws. US20140162036 further states that it is believed that theacid etching can clear away a majority of surface flaws smaller than 1micron, and that while acid etching may not remove larger flaws, theacid etching procedure will tend to round the flaw tip which wouldotherwise dramatically decrease the stress concentration factor.US20140162036 concludes that improvement in glass surface (e.g., removalof small surface flaws and rounding the tips of larger flaws) candramatically increase glass strength, such as impact resistance, and ifonly a relatively small depth of glass is removed, that will not resultin significant compressive stress drop in the glass sheet which hasrelatively high compressive stress at a much larger depth into the glasssheet such as 40 microns from the surface.

Therefore, it was surprising that contacting a strengthened glasssubstrate with a compressive stress layer with etching or strippingsolution to remove organic and/or inorganic layers caused the substrateto have a reduced compressive stress at the surface.

The present disclosure provides a methods of etching an inorganic layeron a glass substrate. In one embodiment, a method comprises contactingthe glass substrate including an inorganic layer with an etchingsolution including a polar organic solvent and an etchant. The inorganiclayer is removed at an inorganic layer etching rate and the glasssubstrate is etched as a glass etching rate. The polar solvent isselected to promote etching of the inorganic layer and control the glassetching rate. The etchant can be any suitable etchant to removeinorganic layers from a glass substrate, particularly antireflectivelayers that contain titanium such as titanium dioxide and titaniumcarbide. In one or more embodiments, the etchant is selected from HCl,NH₄HF₂, HF, NaOH, KOH, tetramethyl ammonium hydroxide, and combinationsthereof.

It was found that the addition of a polar organic solvent to an etchingsolution containing an etchant and water reduced the etching rate ofglass substrates containing inorganic and organic layers. In particular,it was found that the addition of one or more lower aliphatic alcoholsand lower alkylene glycols, where “lower” refers to five or fewer carbonatoms, reduced the etching rate of the glass and prevented reduction ofthe compressive stress at the surface of the glass substrate. Suitablepolar organic solvents include but are not limited to the polar organicsolvent is selected from the group consisting of methanol, ethanol,propanol, propylene glycol, ethylene glycol, and mixtures thereof.

According to one or more embodiments, methods of etching an inorganiclayer on a glass substrate include contacting the glass substratecontaining an inorganic layer such as an antireflective layer containingtitanium with an etching solution which comprises polar organic solventin the range of 10 wt. % to 80 wt. %, etchant and water. The etchant canbe any suitable etchant used to remove inorganic layers, for example,HCl, NH₄HF₂, HF, NaOH, KOH, tetramethyl ammonium hydroxide, andcombinations thereof. The etchant can be present in any suitable amount,and the amount can be adjusted to provide the desired etching rate.Suitable amounts include 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50%,55%, 60%, 65%, 70%, 75%, and 80% by weight of the etching solution,including ranges including each of these values, such as 15% to 80% byweight, 15% to 70% by weight, 15% to 65% by weight, 15% to 60% byweight, 15% to 55% by weight, 15% to 50% by weigh, 15% to 45% by weight,15% to 40% by weight, 15% to 35% by weight, 15% to 30% by weigh and 15%to 25% by weight. An exemplary range of polar solvent in the etchingsolution is in the range of 25 wt. % to 75 wt. %, where the solutionfurther includes etchant and water.

In specific embodiments, the etchant comprises 10% NaOH in water and thepolar solvent comprises propylene glycol. In other specific embodiments,the glass substrate containing the inorganic layer is contacted with theetching solution at a temperature in the range of 25° C. to 100° C. fora period of time ranging from 30 seconds to 10 minutes, or 30 seconds to9 minutes, or 30 seconds to 8 minutes or 30 seconds to 7 minutes or 30seconds to 6 minutes, or 30 seconds to 5 minutes or 30 seconds to 4minutes or 30 seconds to 3 minutes. It will be appreciated that the timeand temperature can be adjusted to achieve the desired reduction inetching rate of the glass and to provide a substrate in which thereduction in compressive stress at the surface is acceptable oreliminated.

As described above, the glass substrate can be a thermally and/or achemically strengthened glass composition with a compressive stresslayer having a compressive depth of layer. A chemically strengthenedglass composition can be ion exchanged to a depth of layer of at leastabout 10 μm, at least about 20 μm, at least about 30 μm, at least about40 μm, at least about 50 μm, at least about 60 μm, at least about 70 μm,or at least about 80 μm.

In chemically strengthened glass substrates, the replacement of smallerions by larger ions at a temperature below that at which the glassnetwork can relax produces a distribution of ions across the surface ofthe glass that results in a stress profile. The larger volume of theincoming ion produces a compressive stress (CS) on the surface andtension (central tension, or CT) in the center of the glass. Thecompressive stress is related to the central tension by the followingapproximate relationship (Equation 1):

${C\; T} \simeq \frac{C\; S \times D\; O\; L}{{thickness} - {2 \times D\; O\; L}}$

where thickness is the total thickness of the strengthened glasssubstrate and compressive depth of layer (DOL) is the depth of exchange.Depth of exchange may be described as the depth within the strengthenedglass or glass ceramic substrate (i.e., the distance from a surface ofthe glass substrate to an interior region of the glass or glass ceramicsubstrate), at which ion exchange facilitated by the ion exchangeprocess takes place. Unless otherwise specified, central tension CT andcompressive stress CS are expressed herein in megaPascals (MPa), whereasthickness and depth of layer DOL are expressed in millimeters ormicrons. It will be appreciated that CT is dependent on threeparameters—CS, DOL and thickness.

As used herein, the terms “depth of layer” and “DOL” refer to the depthof the compressive layer as determined by surface stress meter (FSM)measurements using commercially available instruments such as theFSM-6000.

As used herein, the terms “depth of compression” and “DOC” refer to thedepth at which the stress within the glass changes from compressive totensile stress. At the DOC, the stress crosses from a positive(compressive) stress to a negative (tensile) stress and thus has a valueof zero.

As described herein, compressive stress (CS) and central tension (CT)are expressed in terms of megaPascals (MPa), depth of layer (DOL) anddepth of compression (DOC) are expressed in terms of microns (μm), where1 μm=0.001 mm, and thickness t is expressed herein in terms ofmillimeters, where 1 mm=1000 μm, unless otherwise specified.

Compressive stress CS and depth of layer DOL are stress profileparameters that have been used for years to enable quality control ofchemical strengthening. Compressive stress CS provides an estimate ofthe surface compression, an important parameter that correlates wellwith the amount of stress that needs to be applied to cause a failure ofa glass article, particularly when the glass is free of substantiallydeep mechanical flaws. Depth of layer DOL has been used as anapproximate measure of the depth of penetration of the larger(strengthening) cation (e.g., K⁺ during K⁺ for Na⁺ exchange), withlarger DOL correlating well with greater depths of the compressionlayer, protecting the glass by arresting deeper flaws, and preventingflaws from causing failure under conditions of relatively low externallyapplied stress.

Ion exchange is commonly used to chemically strengthen glasses. In oneparticular example, alkali cations within a source of such cations(e.g., a molten salt, or “ion exchange,” bath) are exchanged withsmaller alkali cations within the glass to achieve a layer that is undera compressive stress (CS) near the surface of the glass. For example,potassium ions from the cation source are often exchanged with sodiumions within the glass. The compressive layer extends from the surface toa depth within the glass.

The compressive stress is created by chemically strengthening the glassarticle, for example, by the ion exchange processes previously describedherein, in which a plurality of first metal ions in the outer region ofthe glass article is exchanged with a plurality of second metal ions sothat the outer region comprises the plurality of the second metal ions.Each of the first metal ions has a first ionic radius and each of thesecond alkali metal ions has a second ionic radius. The second ionicradius is greater than the first ionic radius, and the presence of thelarger second alkali metal ions in the outer region creates thecompressive stress in the outer region.

At least one of the first metal ions and second metal ions are ions ofan alkali metal. The first ions may be ions of lithium, sodium,potassium, and rubidium. The second metal ions may be ions of one ofsodium, potassium, rubidium, and cesium, with the proviso that thesecond alkali metal ion has an ionic radius greater than the ionicradius than the first alkali metal ion.

According to one or more embodiments, a method of etching a glasssubstrate having an inorganic layer, for example, an antireflectivelayer containing titanium is particularly beneficial in etching orremoving an inorganic layer from a glass described in U.S. Pat. No.8,765,262, the entire content of which is incorporated herein byreference. Thus, the methods of etching described herein can be utilizedon a glass substrate which comprises an alkali aluminosilicate glasscomprising at least about 4 mol % P₂O₅. In specific embodiments, methodsdescribed herein can be used on a substrate comprised of an alkalialuminosilicate glass which comprises from about 40 mol % to about 70mol % SiO₂; from about 11 mol % to about 25 mol % Al₂O₃; from about 4mol % to about 15 mol % P₂O₅; from about 13 mol % to about 25 mol %Na₂O; from about 13 to about 30 mol % R_(x)O; from about 11 to about 30mol % M₂O₃; from 0 mol % to about 1 mol % R₂O; from 0 mol % to about 4mol % B₂O₃, and 3 mol % or less of one or more of TiO₂, MnO, Nb₂O₅,MoO₃, Ta₂O₅, WO₃, ZrO₂, Y₂O₃, La₂O₃, HfO₂, CdO, SnO₂, Fe₂O₃, CeO₂,As₂O₃, Sb₂O₃, Cl, and Br; wherein R_(x)O is the sum of the alkali metaloxides, alkaline earth metal oxides, and transition metal monoxidespresent in the glass. In one or more embodiments, the methods describedherein are useful for etching a layer from a glass substrate whichcomprises a glass composition that is an alkali aluminosilicate glasscomprising at least about 4 mol % P₂O₅ wherein the glass islithium-free; and 1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3; where M₂O₃=Al₂O₃+B₂O₃, andR₂O is the sum of monovalent cation oxides present in the glass. In oneor more embodiments, the alkali aluminosilicate glass has a compressivelayer extending from a surface of the glass to the depth of layer, andwherein the compressive layer is under a compressive stress of at leastabout 300 MPa, or at least about 500 MPa.

According to one or more embodiments, a method of etching a glasssubstrate having an inorganic layer, for example, an antireflectivelayer containing titanium is particularly beneficial in etching orremoving an inorganic layer from a glass described in U.S. Pat. No.8,759,238, the entire content of which is incorporated herein byreference. Thus, the methods of etching described herein can be utilizedon a glass substrate which comprises an alkali aluminosilicate glassfree of lithium and comprises 0.1-10 mol % P₂O₅ and at least 5 mol %Al₂O₃. According to one or more embodiments, the glass is ion exchangedto a depth of layer of at least about 30 μm. In one or more embodiments,the alkali aluminosilicate glass has a compressive layer extending froma surface of the glass to the depth of layer, and wherein thecompressive layer is under a compressive stress of at least about 300MPa, or at least about 500 MPa.

According to one or more embodiments, a method of etching a glasssubstrate having an inorganic layer, for example, an antireflectivelayer containing titanium is particularly beneficial in etching orremoving an inorganic layer from a glass substrate comprising an alkalialuminosilicate glass which comprises up to about 10 mol % Li₂O. In oneor more embodiments, the alkali aluminosilicate glass comprises at leastabout 4 mol % P₂O₅ and from 0 mol % to about 4 mol % B₂O₃, wherein1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3, where M₂O₃═Al₂O₃+B₂O₃, and R₂O is the sum ofmonovalent cation oxides present in the alkali aluminosilicate glass. Inone or more embodiments, the glass is ion exchanged to a depth of layerof at least about 30 μm. In one or more embodiments, the alkalialuminosilicate glass has a compressive layer extending from a surfaceof the glass to the depth of layer, and wherein the compressive layer isunder a compressive stress of at least about 300 MPa, or at least about500 MPa.

According to one or more embodiments, a method of etching a glasssubstrate having an inorganic layer, for example, an antireflectivelayer containing titanium is particularly beneficial in etching orremoving an inorganic layer from a glass substrate which comprises aglass composition which is an alkali aluminosilicate glass and comprisesalumina, B₂O₃, and alkali metal oxides, and contains boron cationshaving three-fold coordination. In one or more embodiments, the glasssubstrate has a Vickers crack initiation threshold of at least 7kilogram force (kgf). In one or more embodiments, the glass is ionexchanged to a depth of layer of at least about 30 μm. In one or moreembodiments, the alkali aluminosilicate glass has a compressive layerextending from a surface of the glass to the depth of layer, and whereinthe compressive layer is under a compressive stress of at least about300 MPa. In one or more embodiments, the compressive stress is at leastabout 500 MPa

An embodiment pertains to a method of controlling the etch rate of aglass substrate including an inorganic layer, the method comprisingcontacting the glass substrate including the inorganic layer with anetching solution comprising a polar organic solvent and an etchantselected from HCl, NH₄HF₂, HF, NaOH, KOH, tetramethyl ammoniumhydroxide, and combinations thereof, wherein the inorganic layerincludes titanium and the inorganic layer is removed at an inorganiclayer etching rate and the glass substrate is etched as a glass etchingrate and the glass substrate comprises an ion exchanged glasscomposition with a compressive stress layer having a compressive depthof layer of at least 10 μm and extending from a surface of the glass tothe depth of layer, and wherein the compressive layer is under acompressive stress of at least about 300 MPa. In one or moreembodiments, the polar organic solvent is selected from the groupconsisting of methanol, ethanol, propanol, propylene glycol, ethyleneglycol, and mixtures thereof and is present in the solution in a rangeof from about 25 wt. % and 75 wt. %.

In one or more embodiments, etching a glass substrate having aninorganic layer, for example, an antireflective layer containingtitanium is particularly beneficial in etching or removing an inorganiclayer from a glass substrate comprises alkali aluminosilicate glasswhich comprises or consists essentially of at least one of alumina andboron oxide, and at least one of an alkali metal oxide and an alkaliearth metal oxide, wherein −15 mol %≦(R₂O+R′O—Al₂O₃—ZrO₂)—B₂O₃≦4 mol %,where R is one of Li, Na, K, Rb, and Cs, and R′ is at least one of Mg,Ca, Sr, and Ba. In some embodiments, the alkali aluminosilicate glasscomprises or consists essentially of: from about 62 mol % to about 70mol. % SiO₂; from 0 mol % to about 18 mol % Al₂O₃; from 0 mol % to about10 mol % B₂O₃; from 0 mol % to about 15 mol % Li₂O; from 0 mol % toabout 20 mol % Na₂O; from 0 mol % to about 18 mol % K₂O; from 0 mol % toabout 17 mol % MgO; from 0 mol % to about 18 mol % CaO; and from 0 mol %to about 5 mol % ZrO₂. In some embodiments, the glass comprises aluminaand boron oxide and at least one alkali metal oxide, wherein −15 mol %(R₂O+R′O—Al₂O₃—ZrO₂)—B₂O₃≦4 mol %, where R is at least one of Li, Na, K,Rb, and Cs, and R′ is at least one of Mg, Ca, Sr, and Ba; wherein10≦Al₂O₃+B₂O₃+ZrO₂≦30 and 14≦R₂O+R′O≦25; wherein the silicate glasscomprises or consists essentially of: 62-70 mol. % SiO₂; 0-18 mol %Al₂O₃; 0-10 mol % B₂O₃; 0-15 mol % Li₂O; 6-14 mol % Na₂O; 0-18 mol %K₂O; 0-17 mol % MgO; 0-18 mol % CaO; and 0-5 mol % ZrO₂. The glass isdescribed in U.S. Pat. No. 8,969,226 and U.S. Pat. No. 8,652,978 filedAug. 17, 2012, by Matthew J. Dejneka et al., and entitled “GlassesHaving Improved Toughness And Scratch Resistance,” both claimingpriority to U.S. Provisional Patent Application No. 61/004,677, filed onNov. 29, 2008. The contents of all of the above patent and patentapplication are incorporated herein by reference in their entirety.

In another embodiment, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate which comprises an alkali aluminosilicate glass whichcomprises or consists essentially of: from about 60 mol % to about 70mol % SiO₂; from about 6 mol % to about 14 mol % Al₂O₃; from 0 mol % toabout 15 mol % B₂O₃; from 0 mol % to about 15 mol % Li₂O; from 0 mol %to about 20 mol % Na₂O; from 0 mol % to about 10 mol % K₂O; from 0 mol %to about 8 mol % MgO; from 0 mol % to about 10 mol % CaO; from 0 mol %to about 5 mol % ZrO₂; from 0 mol % to about 1 mol % SnO₂; from 0 mol %to about 1 mol % CeO₂; less than about 50 ppm As₂O₃; and less than about50 ppm Sb₂O₃; wherein 12 mol % Li₂O+Na₂O+K₂O≦20 mol % and 0 mol%≦MgO+CaO≦10 mol %. In some embodiments, the alkali aluminosilicateglass comprises or consists essentially of: 60-70 mol % SiO₂; 6-14 mol %Al₂O₃; 0-3 mol % B₂O₃; 0-1 mol % Li₂O; 8-18 mol % Na₂O; 0-5 mol % K₂O;0-2.5 mol % CaO; greater than 0 mol % to 3 mol % ZrO₂; 0-1 mol % SnO₂;and 0-1 mol % CeO₂, wherein 12 mol %<Li₂O+Na₂O+K₂O≦20 mol %, and whereinthe silicate glass comprises less than 50 ppm As₂O₃. In someembodiments, the alkali aluminosilicate glass comprises or consistsessentially of: 60-72 mol % SiO₂; 6-14 mol % Al₂O₃; 0-3 mol % B₂O₃; 0-1mol % Li₂O; 0-20 mol % Na₂O; 0-10 mol % K₂O; 0-2.5 mol % CaO; 0-5 mol %ZrO₂; 0-1 mol % SnO₂; and 0-1 mol % CeO₂, wherein 12 mol%≦Li₂O+Na₂O+K₂O≦20 mol %, and wherein the silicate glass comprises lessthan 50 ppm As₂O₃ and less than 50 ppm Sb₂O₃. The glass is described inU.S. Pat. No. 8,158,543 by Sinue Gomez et al., entitled “Fining Agentsfor Silicate Glasses,” filed on Feb. 25, 2009; U.S. Pat. No. 8,431,502by Sinue Gomez et al., entitled “Silicate Glasses Having Low SeedConcentration,” filed Jun. 13, 2012; and U.S. Pat. No. 8,623,776, bySinue Gomez et al., entitled “Silicate Glasses Having Low SeedConcentration,” filed Jun. 19, 2013, all of which claim priority to U.S.Provisional Patent Application No. 61/067,130, filed on Feb. 26, 2008.The contents of all of the above U.S. patents are incorporated herein byreference in their entirety.

In another embodiment, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate comprising an alkali aluminosilicate glass whichcomprises SiO₂ and Na₂O, wherein the glass has a temperature T_(35kp) atwhich the glass has a viscosity of 35 kilo poise (kpoise), wherein thetemperature T_(breakdown) at which zircon breaks down to form ZrO₂ andSiO₂ is greater than T_(35kp). In some embodiments, the alkalialuminosilicate glass comprises or consists essentially of: from about61 mol % to about 75 mol % SiO₂; from about 7 mol % to about 15 mol %Al₂O₃; from 0 mol % to about 12 mol % B₂O₃; from about 9 mol % to about21 mol % Na₂O; from 0 mol % to about 4 mol % K₂O; from 0 mol % to about7 mol % MgO; and from 0 mol % to about 3 mol % CaO. The glass isdescribed in U.S. Pat. No. 8,802,581 by Matthew J. Dejneka et al.,entitled “Zircon Compatible Glasses for Down Draw,” filed Aug. 10, 2010,and claiming priority to U.S. Provisional Patent Application No.61/235,762, filed on Aug. 29, 2009. The contents of the above patent andpatent application are incorporated herein by reference in theirentirety.

In another embodiment, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate comprises an alkali aluminosilicate glass whichcomprises at least 50 mol % SiO₂ and at least one modifier selected fromthe group consisting of alkali metal oxides and alkaline earth metaloxides, wherein [(Al₂O₃ (mol %)+B₂O₃(mol %))/(Σ alkali metal modifiers(mol %))]>1. In some embodiments, the alkali aluminosilicate glasscomprises or consists essentially of: from 50 mol % to about 72 mol %SiO₂; from about 9 mol % to about 17 mol % Al₂O₃; from about 2 mol % toabout 12 mol % B₂O₃; from about 8 mol % to about 16 mol % Na₂O; and from0 mol % to about 4 mol % K₂O. In some embodiments, the glass comprisesor consists essentially of: at least 58 mol % SiO₂; at least 8 mol %Na₂O; from 5.5 mol % to 12 mol % B₂O₃; and Al₂O₃, wherein [(Al₂O₃ (mol%)+B₂O₃ (mol %))/(Σ alkali metal modifiers (mol %))]>1, Al₂O₃(mol%)>B₂O₃(mol %), 0.9<R₂O/Al₂O₃<1.3. The glass is described in U.S. Pat.No. 8,586,492, entitled “Crack And Scratch Resistant Glass andEnclosures Made Therefrom,” filed Aug. 18, 2010, by Kristen L. Barefootet al., and U.S. patent application Ser. No. 14/082,847, entitled “CrackAnd Scratch Resistant Glass and Enclosures Made Therefrom,” filed Nov.18, 2013, by Kristen L. Barefoot et al., both claiming priority to U.S.Provisional Patent Application No. 61/235,767, filed on Aug. 21, 2009.The contents of the above patent and patent applications areincorporated herein by reference in their entirety.

In another embodiment, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate which comprises an alkali aluminosilicate glass whichcomprises SiO₂, Al₂O₃, P₂O₅, and at least one alkali metal oxide (R₂O),wherein 0.75≦[(P₂O₅(mol %)+R₂O(mol %))/M₂O₃ (mol %)]≦1.2, whereM₂O₃═Al₂O₃+B₂O₃. In some embodiments, the alkali aluminosilicate glasscomprises or consists essentially of: from about 40 mol % to about 70mol % SiO₂; from 0 mol % to about 28 mol % B₂O₃; from 0 mol % to about28 mol % Al₂O₃; from about 1 mol % to about 14 mol % P₂O₅; and fromabout 12 mol % to about 16 mol % R₂O and, in certain embodiments, fromabout 40 to about 64 mol % SiO₂; from 0 mol % to about 8 mol % B₂O₃;from about 16 mol % to about 28 mol % Al₂O₃; from about 2 mol % to about12 mol % P₂O₅; and from about 12 mol % to about 16 mol % R₂O. The glassis described in U.S. patent application Ser. No. 13/305,271 (publishedas United States Patent Application Publication No. 20120135226) by DanaC. Bookbinder et al., entitled “Ion Exchangeable Glass with DeepCompressive Layer and High Damage Threshold,” filed Nov. 28, 2011, andclaiming priority to U.S. Provisional Patent Application No. 61/417,941,filed Nov. 30, 2010. The contents of the above patent applications areincorporated herein by reference in their entirety.

In still another embodiment, etching a glass substrate having aninorganic layer, for example, an antireflective layer containingtitanium is particularly beneficial in etching or removing an inorganiclayer from a glass substrate which comprises an alkali aluminosilicateglass which comprises at least about 50 mol % SiO₂ and at least about 11mol % Na₂O, and has a surface compressive stress of at least about 900MPa. In some embodiments, the glass further comprises Al₂O₃ and at leastone of B₂O₃, K₂O, MgO and ZnO, wherein−340+27.1.Al₂O₃−28.7.B₂O₃+15.6.Na₂O−61.4.K₂O+8.1.(MgO+ZnO)≧0 mol %. Inparticular embodiments, the glass comprises or consists essentially of:from about 7 mol % to about 26 mol % Al₂O₃, from 0 mol % to about 9 mol% B₂O₃; from about 11 mol % to about 25 mol % Na₂O; from 0 mol % toabout 2.5 mol % K₂O; from 0 mol % to about 8.5 mol % MgO; and from 0 mol% to about 1.5 mol % CaO. The glass is described in U.S. patentapplication Ser. No. 13/533,298 (published as United States PatentApplication Publication No. 20130004758), by Matthew J. Dejneka et al.,entitled “Ion Exchangeable Glass with High Compressive Stress,” filedJun. 26, 2012, and claiming priority to U.S. Provisional PatentApplication No. 61/503,734, filed Jul. 1, 2011. The contents of theabove patent applications are incorporated herein by reference in theirentirety.

In other embodiments, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate which comprises an alkali aluminosilicate glass which ision exchangeable and comprises: at least about 50 mol % SiO₂; at leastabout 10 mol % R₂O, wherein R₂O comprises Na₂O; Al₂O₃; and B₂O₃, whereinB₂O₃—(R₂O—Al₂O₃)≧3 mol %. In some embodiments, the glass comprises: atleast about 50 mol % SiO₂; at least about 10 mol % R₂O, wherein R₂Ocomprises Na₂O; Al₂O₃, wherein Al₂O₃(mol %)<R₂O(mol %); and from 3 mol 5to 4.5 mol % B₂O₃, wherein B₂O₃(mol %)-(R₂O(mol %)-Al₂O₃(mol %))≧3 mol%. In certain embodiments, the glass comprises or consists essentiallyof: at least about 50 mol % SiO₂; from about 9 mol % to about 22 mol %Al₂O₃; from about 3 mol % to about 10 mol % B₂O₃; from about 9 mol % toabout 20 mol % Na₂O; from 0 mol % to about 5 mol % K₂O; at least about0.1 mol % MgO, ZnO, or combinations thereof, wherein 0≦MgO≦6 and 0≦ZnO≦6mol %; and, optionally, at least one of CaO, BaO, and SrO, wherein 0 mol%≦CaO+SrO+BaO≦2 mol %. When ion exchanged, the glass, in someembodiments, has a Vickers crack initiation threshold of at least about10 kgf. Such glasses are described in U.S. patent application Ser. No.14/197,658, filed May 28, 2013, by Matthew J. Dejneka et al., entitled“Zircon Compatible, Ion Exchangeable Glass with High Damage Resistance,”which is a continuation of U.S. patent application Ser. No. 13/903,433(published as United States Patent Application Publication No.20140186632), filed May 28, 2013, by Matthew J. Dejneka et al., entitled“Zircon Compatible, Ion Exchangeable Glass with High Damage Resistance,”both claiming priority to Provisional Patent Application No. 61/653,489,filed May 31, 2012. The contents of these patent applications areincorporated herein by reference in their entirety.

In some embodiments, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate which comprises a glass which comprises: at least about50 mol % SiO₂; at least about 10 mol % R₂O, wherein R₂O comprises Na₂O;Al₂O₃, wherein −0.5 mol %≦Al₂O₃(mol %)-R₂O(mol %)≦2 mol %; and B₂O₃, andwherein B₂O₃(mol %)-(R₂O(mol %)-Al₂O₃(mol %))≧4.5 mol %. In otherembodiments, the glass has a zircon breakdown temperature that is equalto the temperature at which the glass has a viscosity of greater thanabout 40 k Poise and comprises: at least about 50 mol % SiO₂; at leastabout 10 mol % R₂O, wherein R₂O comprises Na₂O; Al₂O₃; and B₂O₃, whereinB₂O₃(mol %)-(R₂O(mol %)-Al₂O₃(mol %))≧4.5 mol %. In still otherembodiments, the glass is ion exchanged, has a Vickers crack initiationthreshold of at least about 30 kgf, and comprises: at least about 50 mol% SiO₂; at least about 10 mol % R₂O, wherein R₂O comprises Na₂O; Al₂O₃,wherein −0.5 mol %≦Al₂O₃(mol %)-R₂O(mol %)≦2 mol %; and B₂O₃, whereinB₂O₃(mol %)-(R₂O(mol %)-Al₂O₃(mol %))≧4.5 mol %. Such glasses aredescribed in U.S. patent application Ser. No. 13/903,398 (published asUnited States Patent Application Publication No. 20140106172), byMatthew J. Dejneka et al., entitled “Ion Exchangeable Glass with HighDamage Resistance,” filed May 28, 2013, claiming priority from U.S.Provisional Patent Application No. 61/653,485, filed May 31, 2012. Thecontents of these patent applications are incorporated herein byreference in their entirety.

In certain embodiments, etching a glass substrate having an inorganiclayer, for example, an antireflective layer containing titanium isparticularly beneficial in etching or removing an inorganic layer from aglass substrate which comprises an alkali aluminosilicate glass whichcomprises at least about 4 mol % P₂O₅, wherein (M₂O₃ (mol %)/R_(x)O (mol%))<1, wherein M₂O₃═Al₂O₃+B₂O₃, and wherein R_(x)O is the sum ofmonovalent and divalent cation oxides present in the alkalialuminosilicate glass. In some embodiments, the monovalent and divalentcation oxides are selected from the group consisting of Li₂O, Na₂O, K₂O,Rb₂O, Cs₂O, MgO, CaO, SrO, BaO, and ZnO. In some embodiments, the glassis lithium-free and consists essentially of from about 40 mol % to about70 mol % SiO₂; from about 11 mol % to about 25 mol % Al₂O₃; from about 4mol % to about 15 mol % P₂O₅; from about 13 mol % to about 25 mol %Na₂O; from about 13 to about 30 mol % R_(x)O, where wherein R_(x)O isthe sum of the alkali metal oxides, alkaline earth metal oxides, andtransition metal monoxides present in the glass; from about 11 to about30 mol % M₂O₃, where M₂O₃═Al₂O₃+B₂O₃; from 0 mol % to about 1 mol % K₂O;from 0 mol % to about 4 mol % B₂O₃, and 3 mol % or less of one or moreof TiO₂, MnO, Nb₂O₅, MoO₃, Ta₂O₅, WO₃, ZrO₂, Y₂O₃, La₂O₃, HfO₂, CdO,SnO₂, Fe₂O₃, CeO₂, As₂O₃, Sb₂O₃, Cl, and Br; the glass is lithium-free;and 1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3, where R₂O is the sum of monovalent cationoxides present in the glass. The glass is described in U.S. patentapplication Ser. No. 13/678,013 (published as United States PatentApplication Publication No. 20130122284) by Timothy M. Gross, entitled“Ion Exchangeable Glass with High Crack Initiation Threshold,” filedNov. 15, 2012, and U.S. Pat. No. 8,756,262 by Timothy M. Gross, entitled“Ion Exchangeable Glass with High Crack Initiation Threshold,” filedNov. 15, 2012, both claiming priority to U.S. Provisional PatentApplication No. 61/560,434 filed Nov. 16, 2011. The contents of theabove patent and applications are incorporated herein by reference intheir entirety.

In some embodiments, the glasses used in the process described hereinare substantially free of at least one of arsenic, antimony, barium,strontium, bismuth, and their compounds. In other embodiments, theglasses may include up to about 0.5 mol % Li₂O, or up to about 5 mol %Li₂O or, in some embodiments, up to about 10 mol % Li₂O. in still otherembodiments, the glass may be free of Li₂O.

In some embodiments, the glasses used in the process described herein,when ion exchanged, are resistant to introduction of flaws by sharp orsudden impact. Accordingly, these ion exchanged glasses exhibit Vickerscrack initiation threshold of at least about 10 kilogram force (kgf). Incertain embodiments, these glasses exhibit a Vickers crack initiationthreshold of at least 20 kgf and, in some embodiments, at least about 30kgf, and up to 50 kgf.

The glasses used in the process described herein may, in someembodiments, be down-drawable by processes known in the art, such asslot-drawing, fusion drawing, re-drawing, and the like, and have aliquidus viscosity of at least 130 kilopoise. In addition to thosecompositions listed hereinabove, various other ion exchangeable alkalialuminosilicate glass compositions may be used.

The strengthened glasses used in the process described herein areconsidered suitable for various two- and three-dimensional shapes andmay be utilized in various applications, and various thicknesses arecontemplated herein. In some embodiments, the glass article has athickness in a range from about 0.1 mm up to about 2.0 mm. In someembodiments, the glass article has a thickness in a range from about 0.1mm up to about 1.0 mm and, in certain embodiments, from about 0.1 mm upto about 0.5 mm.

Strengthened glass substrates used in the process described herein mayalso be defined by their central tension CT. In one or more embodiments,the strengthened glass articles described herein have a CT≦150 MPa, or aCT≦125 MPa, or CT≦100 MPa. The central tension of the strengthened glasscorrelates to the frangible behavior of the strengthened glass article.

The following non-limiting examples are illustrative of one or moreembodiments.

EXAMPLES Example 1

Glass substrates, which were 1 mm thick and comprising a compositionwhich included 57.5 mol % SiO₂, 16.5 mol % Al₂O₃, 16.5 mol % Na₂O, 2.8mol % MgO, 6.5 mol % P₂O₅, and 0.05 mol % SnO₂ were exposed to variousetchant solutions with the following results. The etching solutionscomprised the etchant listed in water at the concentration listed below

Etchant Weight loss/cm² HCl 5% 24 hr 50.02 mg/cm² 95° C. NH4:HF 10% 4.58 mg/cm² 20 min 20° C. HF 10% 20 min 37.89 mg/cm² 20° C. NaOH 10% 6hr  5.8 mg/cm² 95° C.

Example 2

Four different ion exchanged glass substrates having the samecomposition used in Example 1 were exposed to an etching solution NaOH10% in water at 60° C. A first sample was exposed to the solutionwithout the addition of propylene glycol. A second sample included 25%by weight propylene glycol added to the etching solution. A third sampleincluded 50% by weight propylene glycol added to the etching solution,and a fourth sample included 75% by weight propylene glycol added to theetching solution. FIG. 2 shows the etching rates for each of the fouretching solutions. FIG. 2 shows that the etching rate of the glass canbe controlled by the addition of a polar organic solvent, propyleneglycol.

Example 3

Four different glass substrates having the same composition used inExample 1 were exposed to an etching solution. The transmittance spectraof the substrates were measured at the wavelengths shown in FIG. 3. Line200 shows the transmittance spectrum for a 0.7 mm thick ion exchangedsubstrate having a 10 nm TiO₂ coating after exposure to an etchant. Line210 in FIG. 3 shows the spectra for a 0.55 mm thick glass substrate thatwas not ion exchanged and did not contain a coating. Line 220 shows thetransmittance spectra for a 0.7 mm thick ion exchanged substrate havinga 10 nm TiO₂ etched by an etching solution comprising 10 wt % NaOH inwater and containing 50 wt % propylene glycol at 60° C. for 2 minutes.Line 230 shows the transmittance spectra a 0.7 mm thick ion exchangedsubstrate having a 10 nm TiO₂ layer etched by an etching solutioncomprising 10 wt % NaOH containing 75 wt % PG at 60 C for 2 min. TheTransmittance spectra suggested that the 10 nm-TiO2 coating film can beeffectively removed by 10 wt % NaOH in water and containing 75 wt %propylene glycol at 60° C. for 2 minutes. FIG. 3 indicates that the 10nm-TiO₂ layer can be effectively removed by 10 wt % NaOH in watercontaining to 75 wt % of propylene glycol at 60° C. for 2 minutes. It isexpected that other polar organic solvents in various weight ranges willprovide effective results for other etching solutions containing theetchants described herein.

While typical embodiments have been set forth for the purpose ofillustration, the foregoing description should not be deemed to be alimitation on the scope of the disclosure or appended claims.Accordingly, various modifications, adaptations, and alternatives mayoccur to one skilled in the art without departing from the spirit andscope of the present disclosure or appended claims.

1. A method of etching an inorganic layer on a glass substratecomprising: contacting the glass substrate including an inorganic layerwith an etching solution comprising a polar organic solvent and anetchant, wherein the inorganic layer is removed at an inorganic layeretching rate and the glass substrate is etched as a glass etching rate.2. The method of claim 1, wherein the polar solvent is selected topromote etching of the inorganic layer and control the glass etchingrate.
 3. The method of claim 2, wherein the etchant is selected from thegroup consisting of HCl, NH₄HF₂, HF, NaOH, KOH, tetramethyl ammoniumhydroxide, and combinations thereof.
 4. The method of claim 3, whereinthe polar organic solvent is selected from the group consisting of loweraliphatic alcohols and lower alkylene glycols.
 5. The method of claim 4,wherein the polar organic solvent is selected from the group consistingof methanol, ethanol, propanol, propylene glycol, ethylene glycol, andmixtures thereof.
 6. The method of claim 5, wherein the etching solutioncomprises polar organic solvent in the range of 10 wt. % to 80 wt. %,etchant and water.
 7. The method of claim 5, wherein the etchingsolution comprises polar organic solvent in the range of 25 wt. % to 75wt. %, etchant and water.
 8. The method of claim 7, wherein the etchantcomprises 10% NaOH in water and the polar solvent comprises propyleneglycol.
 9. The method of claim 1, wherein the glass substrate iscontacted with the etching solution at a temperature in the range of 25°C. to 100° C. for a period of time ranging from 30 seconds to 5 minutes.10. The method of claim 8, wherein the glass substrate is contacted withthe etching solution at a temperature in the range of 25° C. to 100° C.for a period of time ranging from 30 seconds to 5 minutes.
 11. Themethod of claim 2, wherein the glass substrate comprises a glasscomposition that has been strengthened by one or more of chemicalstrengthening and thermal strengthening.
 12. The method of claim 3,wherein the glass substrate comprises a chemically strengthened glasscomposition with a compressive stress layer having a compressive depthof layer.
 13. The method of claim 9, wherein the chemically strengthenedglass composition is ion exchanged to a depth of layer of at least about10 μm.
 14. The method of claim 13, wherein the glass composition is analkali aluminosilicate glass comprising at least about 4 mol % P₂O₅. 15.The method of claim 14, wherein the alkali aluminosilicate glasscomprises from about 40 mol % to about 70 mol % SiO₂; from about 11 mol% to about 25 mol % Al₂O₃; from about 4 mol % to about 15 mol % P₂O₅;from about 13 mol % to about 25 mol % Na₂O; from about 13 to about 30mol % R_(x)O; from about 11 to about 30 mol % M₂O₃; from 0 mol % toabout 1 mol % K₂O; from 0 mol % to about 4 mol % B₂O₃, and 3 mol % orless of one or more of TiO₂, MnO, Nb₂O₅, MoO₃, Ta₂O₅, WO₃, ZrO₂, Y₂O₃,La₂O₃, HfO₂, CdO, SnO₂, Fe₂O₃, CeO₂, As₂O₃, Sb₂O₃, Cl, and Br; whereinR_(x)O is the sum of the alkali metal oxides, alkaline earth metaloxides, and transition metal monoxides present in the glass.
 16. Themethod of claim 15, wherein the glass is lithium-free; and1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3; where M₂O₃═Al₂O₃+B₂O₃, and R₂O is the sum ofmonovalent cation oxides present in the glass.
 17. The method of claim15, wherein the glass is ion exchanged to a depth of layer of at leastabout 30 μm.
 18. The method of claim 17, wherein the alkalialuminosilicate glass has a compressive layer extending from a surfaceof the glass to the depth of layer, and wherein the compressive layer isunder a compressive stress of at least about 300 MPa.
 19. The method ofclaim 18, wherein the compressive stress is at least about 500 MPa. 20.The method of claim 13, wherein the glass composition is an alkalialuminosilicate glass free of lithium and comprises 0.1-10 mol % P₂O₅and at least 5 mol % Al₂O₃.
 21. The method of claim 20, wherein theglass is ion exchanged to a depth of layer of at least about 30 μm. 22.The method of claim 21, wherein the alkali aluminosilicate glass has acompressive layer extending from a surface of the glass to the depth oflayer, and wherein the compressive layer is under a compressive stressof at least about 300 MPa.
 23. The method of claim 22, wherein thecompressive stress is at least about 500 MPa.
 24. The method of claim13, wherein the glass composition is an alkali aluminosilicate glass andfurther comprises up to about 10 mol % Li₂O.
 25. The method of claim 24,wherein the alkali aluminosilicate glass comprises at least about 4 mol% P₂O₅ and from 0 mol % to about 4 mol % B₂O₃, wherein1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3, where M₂O₃═Al₂O₃+B₂O₃, and R₂O is the sum ofmonovalent cation oxides present in the alkali aluminosilicate glass.26. The method of claim 25, wherein the glass is ion exchanged to adepth of layer of at least about 30 μm.
 27. The method of claim 26,wherein the alkali aluminosilicate glass has a compressive layerextending from a surface of the glass to the depth of layer, and whereinthe compressive layer is under a compressive stress of at least about300 MPa.
 28. The method of claim 27, wherein the compressive stress isat least about 500 MPa.
 29. The method of claim 13, wherein the glasscomposition is an alkali aluminosilicate glass and comprises alumina,B₂O₃, and alkali metal oxides, and contains boron cations havingthree-fold coordination.
 30. The method of claim 29, wherein the glasssubstrate has a Vickers crack initiation threshold of at least 7kilogram force (kgf).
 31. The method of claim 30, wherein the glass ision exchanged to a depth of layer of at least about 30 μm.
 32. Themethod of claim 31, wherein the alkali aluminosilicate glass has acompressive layer extending from a surface of the glass to the depth oflayer, and wherein the compressive layer is under a compressive stressof at least about 300 MPa.
 33. The method of claim 32, wherein thecompressive stress is at least about 500 MPa.
 34. The method of claim 1,wherein the inorganic layer comprises titanium.
 35. A method ofcontrolling the etch rate of a glass substrate including an inorganiclayer, the method comprising contacting the glass substrate includingthe inorganic layer with an etching solution comprising a polar organicsolvent and an etchant selected from HCl, NH₄HF₂, HF, NaOH, KOH,tetramethyl ammonium hydroxide, and combinations thereof, wherein theinorganic layer includes titanium and the inorganic layer is removed atan inorganic layer etching rate and the glass substrate is etched as aglass etching rate and the glass substrate comprises an ion exchangedglass composition with a compressive stress layer having a compressivedepth of layer of at least 10 μm and extending from a surface of theglass to the depth of layer, and wherein the compressive layer is undera compressive stress of at least about 300 MPa.
 36. The method of claim35, wherein the polar organic solvent is selected from the groupconsisting of methanol, ethanol, propanol, propylene glycol, ethyleneglycol, and mixtures thereof and is present in the solution in a rangeof from about 25 wt. % and 75 wt. %.
 37. The method of claim 36, whereinthe glass composition is an alkali aluminosilicate glass and furthercomprises up to about 10 mol % Li₂O.
 38. The method of claim 37, whereinthe alkali aluminosilicate glass comprises at least about 4 mol % P₂O₅and from 0 mol % to about 4 mol % B₂O₃, wherein1.3<[(P₂O₅+R₂O)/M₂O₃]≦2.3, where M₂O₃═Al₂O₃+B₂O₃, and R₂O is the sum ofmonovalent cation oxides present in the alkali aluminosilicate glass.39. The method of claim 36, wherein the glass composition is an alkalialuminosilicate glass and comprises alumina, B₂O₃, and alkali metaloxides, and contains boron cations having three-fold coordination. 40.The method of claim 39, wherein the glass substrate has a Vickers crackinitiation threshold of at least 7 kilogram force (kgf).